Benjamin Kriegel

Title: **The Innovative Mind of Benjamin Kriegel: Pioneering Fabrication Techniques**

Introduction

Benjamin Kriegel, based in Portland, Oregon, is a notable inventor recognized for his contributions to the field of integrated circuit structures. With a keen focus on innovation, he has secured a patent that showcases his expertise and creative approach to semiconductor fabrication.

Latest Patents

Kriegel's patent, titled "Fabrication of Gate-All-Around Integrated Circuit Structures Having Pre-Spacer Deposition Cut Gates," outlines an advanced method for creating gate-all-around integrated circuits. This innovative design includes a first vertical arrangement of horizontal nanowires and a second vertical arrangement, each equipped with its respective gate stack. Notably, the end of the second gate stack is spaced apart from the first, creating a gap that is filled by a specialized dielectric structure. This breakthrough presents significant implications for the efficiency and performance of integrated circuits.

Career Highlights

As an inventor at Intel Corporation, Benjamin Kriegel has played a crucial role in pushing the boundaries of technology. His work not only emphasizes his technical knowledge but also his ability to translate complex concepts into practical applications within the semiconductor industry.

Collaborations

Kriegel's journey as an inventor has also included collaborations with esteemed colleagues such as Leonard P. Guler and Michael K. Harper. These partnerships reflect the importance of teamwork in the innovation process, allowing for the exchange of ideas and expertise that can lead to groundbreaking advancements.

Conclusion

In conclusion, Benjamin Kriegel stands out as an influential figure in the realm of integrated circuit innovation. With his patent and ongoing work at Intel Corporation, he continues to inspire the industry, showcasing the potential of creative engineering solutions in the fast-evolving world of technology.