Company Filing History:
3 out of 336 
1 out of 37 
Years Active: 2012-2015
Title: The Innovations of Benjamin J. Feist
Introduction
Benjamin J. Feist is an accomplished inventor based in Wilmington, Delaware. He holds three patents that showcase his expertise in the field of materials science and thin film deposition technologies. His work has significantly contributed to advancements in the deposition of metal-containing films.
Latest Patents
One of his latest patents is titled "Metal precursors containing beta-diketiminato ligands." This patent describes methods and compositions for depositing a metal-containing thin film on a substrate. The process involves introducing a vapor phase metal-organic precursor into a reaction chamber containing one or more substrates. The precursor includes at least one β-diketiminato ligand and has a specific general formula. The metal selected for this invention includes nickel, cobalt, ruthenium, iridium, palladium, platinum, silver, and gold. The substrate is maintained at a temperature between about 100°C and about 500°C during the deposition process.
Another significant patent by Feist is "Alkali earth metal precursors for depositing calcium and strontium containing films." This patent outlines methods and compositions for the deposition of a film on a substrate using precursors containing calcium or strontium. These innovations are crucial for various applications in electronics and materials engineering.
Career Highlights
Throughout his career, Benjamin J. Feist has worked with notable companies such as American Air Liquide, Inc. and Air Liquide Electronics U.S. LP. His experience in these organizations has allowed him to develop and refine his innovative approaches to thin film deposition.
Collaborations
Feist has collaborated with talented professionals in his field, including Christian Dussarrat and Olivier Letessier. These collaborations have further enhanced his research and development efforts.
Conclusion
Benjamin J. Feist is a prominent inventor whose contributions to the field of materials science are noteworthy. His patents reflect his innovative spirit and commitment to advancing technology in thin film deposition. His work continues to influence the industry and inspire future innovations.