This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Aixtron Se. Active years: 2024-2026.
Company Filing History:
Years Active: 2024-2026
Title: Innovations of Benjamin David Wright
Introduction
Benjamin David Wright is a notable inventor based in Cambridge, GB. He has made significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of 3 patents, his work focuses on enhancing substrate handling and deposition processes.
Latest Patents
Wright's latest patents include a CVD reactor with a carrying ring for substrate handling. This invention features a susceptor assembly situated in a reactor housing, which includes at least one wide side plane facing a process chamber, at least one pocket, and a carrying element for handling substrates. The design aims to reduce the growth of parasitic deposits on the carrying element. Another patent involves a cover plate for a device that deposits silicon carbide (SiC) layers on flat substrates. This device includes a heated susceptor and inner cover plates that are strategically arranged to optimize the deposition process.
Career Highlights
Wright is currently associated with Aixtron SE, a company known for its advanced deposition equipment. His work at Aixtron SE has positioned him as a key player in the development of innovative technologies in the semiconductor industry.
Collaborations
Some of his notable coworkers include Barry O'Neil and Barry O′Neil, who have collaborated with him on various projects within the company.
Conclusion
Benjamin David Wright's contributions to CVD technology and his innovative patents reflect his expertise and commitment to advancing the field. His work continues to influence the development of efficient substrate handling and deposition techniques.