Hataitai, New Zealand

Ben Wylie-Van Eerd

This inventor holds 1 USPTO granted patent. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ben Wylie-Van Eerd. Retrieved from https://idiyas.com/inventor/ben-wylie-van-eerd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Ben Wylie-Van Eerd

Introduction

Ben Wylie-Van Eerd is a notable inventor based in Hataitai, Wellington, New Zealand. He has made significant contributions to the field of optics, particularly through his innovative patent related to microlithographic projection exposure systems. His work exemplifies the intersection of technology and creativity, showcasing the potential of modern inventions.

Latest Patents

Ben Wylie-Van Eerd holds a patent for a mirror designed specifically for microlithographic projection exposure systems. This innovative mirror features a substrate, a reflection layer stack that reflects electromagnetic radiation, and at least one piezoelectric layer. The piezoelectric layer is strategically arranged between the substrate and the reflection layer stack, allowing for locally variable deformation when an electric field is applied. This design enhances the mirror's functionality, making it a valuable asset in advanced optical systems.

Career Highlights

Throughout his career, Ben has worked with Carl Zeiss SMT GmbH, a leading company in the field of optical systems. His role at the company has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in technology. His expertise in optics and innovative thinking have positioned him as a key player in his field.

Collaborations

Ben has had the opportunity to work alongside esteemed colleagues such as Frederik Bijkerk and Kerstin Hild. These collaborations have fostered an environment of creativity and innovation, leading to the development of cutting-edge technologies in optics.

Conclusion

Ben Wylie-Van Eerd's contributions to the field of optics through his innovative patent demonstrate the importance of creativity and collaboration in technological advancements. His work continues to influence the industry and inspire future inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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