Bart A Wiles

Title: Bart A Wiles: Innovator in Photomask Technology

Introduction

Bart A Wiles is a notable inventor based in Kokomo, IN (US). He has made significant contributions to the field of photomask technology, particularly through his innovative patent. His work is essential in advancing the efficiency and effectiveness of photomask assembly processes.

Latest Patents

Wiles holds a patent for a "System and method for automatically mounting a pellicle assembly on a photomask." This invention outlines a method that includes loading a photomask into a mounting apparatus and subsequently loading a pellicle assembly into a back plate of the apparatus. The back plate is equipped with load cells that measure the force applied during the mounting process. The invention ensures that the pellicle assembly is mounted correctly if the measured force meets a specified minimum threshold.

Career Highlights

Bart A Wiles is currently employed at Toppan Photomasks, Inc., where he continues to develop and refine technologies related to photomasks. His expertise and innovative mindset have positioned him as a valuable asset in his field.

Collaborations

Wiles has collaborated with talented coworkers, including Ethan M Frye and Kevin L Griffin. Their combined efforts contribute to the advancement of photomask technology and innovation within their organization.

Conclusion

Bart A Wiles exemplifies the spirit of innovation in the field of photomask technology. His contributions through patents and collaboration with colleagues highlight his commitment to advancing this critical area of technology.