Tainan, Taiwan

Bar-Yuan Hsieh

This inventor holds 6 USPTO granted patents and 3 published patent applications. Top assignee: Chi Mei Corporation. Active years: 2015-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bar-Yuan Hsieh. Retrieved from https://idiyas.com/inventor/bar-yuan-hsieh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6 

Average Co-Inventor Count = 1.9

ph-index = 1


Location History:

  • Tainan, TW (2015 - 2018)
  • Taichung, TW (2015 - 2018)

Company Filing History:


Years Active: 2015-2018

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6 patents (USPTO):Explore Patents

Title: Innovator Bar-Yuan Hsieh: Pioneering Advances in Photosensitive Resin Technologies

Introduction

Bar-Yuan Hsieh is a notable inventor based in Tainan, Taiwan. With an impressive portfolio of six patents, he has made significant contributions to the field of resin technology, specifically in developing innovative materials used in color filter applications. His work reflects a dedication to enhancing both the functionality and efficiency of photosensitive materials.

Latest Patents

Among Bar-Yuan Hsieh's latest inventions are two key patents focused on alkali-soluble resins and their applications within photosensitive resin compositions for color filters. The first patent relates to an alkali-soluble resin (A) and a corresponding photosensitive resin composition that includes a compound (B) with an ethylenically unsaturated group, a photoinitiator (C), and an organic solvent (D). This innovation significantly improves the film thickness change rate in thermal solvents and enhances the linearity of patterns, achieving a high finesse in color filters.

The second patent similarly details a photosensitive resin composition for color filters, emphasizing the integration of an alkali-soluble resin (A), a vinyl unsaturated group compound (B), a photo-initiator (C), an organic solvent (D), and a pigment (E). The formulation of the alkali-soluble resin (A) is derived from copolymerizing several vinyl unsaturated monomers, showcasing Hsieh's ingenuity in resin composition design.

Career Highlights

Bar-Yuan Hsieh has built his career at Chi Mei Corporation, where he has honed his expertise in material science and resin development. His innovative spirit and technical knowledge have greatly contributed to the company's advancements in electronic materials, particularly in color filter technologies for display screens.

Collaborations

During his time at Chi Mei Corporation, Bar-Yuan Hsieh has collaborated with talented individuals, including his coworkers Jung-Pin Hsu and Cheng-Chang Hsu. Their collective efforts have fostered a creative environment that encourages breakthroughs in resin compositions and their applications, further pushing the boundaries of technology in color filter manufacturing.

Conclusion

Bar-Yuan Hsieh stands out as a leading innovator in the field of photosensitive resins, with a keen eye for detail and a commitment to advancing technology in color filter applications. His patents serve as a testament to his innovative approach and collaborative spirit, paving the way for future developments in the industry. As technology progresses, Bar-Yuan Hsieh's contributions will undoubtedly influence upcoming innovations and applications in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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