The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10088612 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 02, 2018

Filed:

Nov. 17, 2015
Applicant:

Chi Mei Corporation, Tainan, TW;

Inventors:

Cheng-Chang Hsu, Tainan, TW;

Bar-Yuan Hsieh, Tainan, TW;

Assignee:

CHI MEI CORPORATION, Tainan, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/00 (2006.01); G02B 5/22 (2006.01); C08G 59/32 (2006.01); C08G 59/26 (2006.01); G02B 1/14 (2015.01); G02F 1/1335 (2006.01); C09D 163/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/223 (2013.01); C08G 59/26 (2013.01); C08G 59/32 (2013.01); C08G 59/3245 (2013.01); C09D 163/00 (2013.01); G02B 1/14 (2015.01); G02F 1/133514 (2013.01);
Abstract

The present invention relates to an alkali-soluble resin (A) and a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes the alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C) and an organic solvent (D). The photosensitive resin composition according to the present invention can improve the change rate of film thickness in thermal solvent and linearity of pattern with high finesse of the color filter.


Find Patent Forward Citations

Hsu, Cheng-Chang. (2018). Alkali-soluble resin, photosensitive resin composition for color filter containing the same and uses thereof (U.S. Patent No. 10088612). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10088612

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