The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2017

Filed:

Sep. 09, 2015
Applicant:

Chi Mei Corporation, Tainan, TW;

Inventors:

Yu-Ju Wu, Tainan, TW;

Bar-Yuan Hsieh, Tainan, TW;

Jung-Pin Hsu, Tainan, TW;

Assignee:

CHI MEI CORPORATION, Tainan, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/23 (2006.01); G02F 1/1335 (2006.01); G03F 7/032 (2006.01); G02B 5/20 (2006.01); G02B 5/22 (2006.01); G03F 1/00 (2012.01); C09B 67/50 (2006.01);
U.S. Cl.
CPC ...
G03F 7/032 (2013.01); G02B 5/20 (2013.01); G02B 5/223 (2013.01); G02F 1/133514 (2013.01); G02F 1/133516 (2013.01);
Abstract

The present invention relates to a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), a pigment (D) and an organic solvent (E). The photosensitive resin composition according to the present invention can improve linearity of pattern with high finesse and developing-resistance of the color filter.


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