Yu-Ju Wu

Title: Innovations of Yu-Ju Wu in Photosensitive Resin Composition

Introduction

Yu-Ju Wu is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions for color filters. His innovative work has implications for various applications in the electronics industry.

Latest Patents

Yu-Ju Wu holds a patent for a "Photosensitive resin composition for color filter and uses thereof." This invention relates to a photosensitive resin composition that includes an alkali-soluble resin, a compound containing an ethylenically unsaturated group, a photoinitiator, a pigment, and an organic solvent. The composition is designed to improve the linearity of patterns with high finesse and enhance the developing resistance of color filters. This patent showcases his expertise in creating advanced materials that meet the demands of modern technology.

Career Highlights

Yu-Ju Wu is associated with Chi Mei Corporation, a leading company in the field of materials and electronics. His role at the company has allowed him to work on cutting-edge projects that push the boundaries of innovation. With a focus on developing high-performance materials, Wu has established himself as a key figure in his field.

Collaborations

Some of his notable coworkers include Bar-Yuan Hsieh and Jung-Pin Hsu. Their collaborative efforts contribute to the advancement of technology and innovation within their projects.

Conclusion

Yu-Ju Wu's contributions to the field of photosensitive resin compositions highlight his innovative spirit and dedication to advancing technology. His work not only enhances the performance of color filters but also sets a foundation for future developments in the industry.