Coventry, United Kingdom

Babak Khamsehpour


Average Co-Inventor Count = 7.0

ph-index = 2

Forward Citations = 235(Granted Patents)


Company Filing History:


Years Active: 2000-2001

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2 patents (USPTO):Explore Patents

Title: Innovations of Babak Khamsehpour in Semiconductor Technology

Introduction

Babak Khamsehpour is a notable inventor based in Coventry, GB, recognized for his contributions to semiconductor technology. He holds two patents that focus on advanced methods for surface treatment of semiconductor substrates. His work has significant implications for the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Khamsehpour's latest patents include a method of surface treatment of semiconductor substrates, which involves depositing a sidewall passivation layer on an etched feature using a hydrocarbon deposition gas. This innovative approach determines specific mixture percentages for the hydrocarbon gas that optimize the etch rate of the substrate. By maintaining the mixture percentage within a selected range, he utilizes varying ion energies to achieve high aspect-ratio features in semiconductor substrates. Another patent focuses on etching trenches in semiconductor substrates using a combination of reactive ion etching and chemical vapor deposition, where multiple parameters are adjusted over time to enhance the etching and deposition processes.

Career Highlights

Khamsehpour is currently employed at Surface Technology Systems Plc, where he applies his expertise in semiconductor technology. His work has contributed to advancements in the field, particularly in improving the methods used for surface treatment of semiconductor substrates.

Collaborations

He collaborates with talented coworkers, including Jyoti Kiron Bhardwaj and Huma Ashraf, who contribute to the innovative environment at Surface Technology Systems Plc.

Conclusion

Babak Khamsehpour's innovative patents and career in semiconductor technology highlight his significant role in advancing manufacturing processes. His contributions are essential for the ongoing development of efficient semiconductor technologies.

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