Aviv Frommer

Title: **Aviv Frommer: Innovating in Overlay Metrology**

Introduction

Aviv Frommer, an accomplished inventor based in D.N. Misgav, Israel, has made significant contributions to the field of overlay metrology. With a portfolio of four patents to his name, his innovative work has paved the way for advanced measurement techniques in various technological applications.

Latest Patents

Among Aviv's latest patents is one focused on "Overlay Metrology Using the Near Infra-red Spectral Range." This groundbreaking method and tool involve generating a filtered illumination beam that includes near-infrared (NIR) radiation. The illumination beam is directed onto an overlay target, allowing for the detection of an optical signal which is subsequently used to measure overlay metrology. This method is particularly beneficial for substrate applications that have layers of opaque material, such as amorphous carbon, which are transmissive in the NIR range. The tool includes components for generating the NIR illumination beam and a detector to process the NIR signals for accurate measurement.

Another notable patent is titled "Target Acquisition and Overlay Metrology Based on Two Diffracted Orders Imaging." This system utilizes a beam generator to direct incident beams towards a periodic target, resulting in a scattering of multiple output beams. An imaging lens system captures the first and second output beams, with angular separation selected to form a sinusoidal image. A sensor then images this sinusoidal representation for further analysis. This innovative approach enhances the efficiency and precision of overlay metrology.

Career Highlights

Throughout his career, Aviv has worked with leading companies in the field, including KLA-Tencor Technologies Corporation and Lynx Photonic Networks, Inc. His roles in these organizations allowed him to integrate his innovative perspectives into practical solutions for complex technological challenges.

Collaborations

Aviv has collaborated with distinguished colleagues, including Michael E. Adel and Vladimir Levinski. These partnerships have facilitated the exchange of ideas and have contributed significantly to the advancement of his research and inventions.

Conclusion

Aviv Frommer stands out as a prominent figure in the realm of overlay metrology. With a robust portfolio of patents and extensive experience in the industry, his contributions continue to shape the future of measurement technologies. His innovative approaches reflect a commitment to advancing the field, making him a notable inventor in today’s technological landscape.