This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Adv Antest Corporation. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: The Innovative Mind of Atsushi Tokuno
Introduction
Atsushi Tokuno is a prominent inventor based in Tokyo, Japan. He is known for his contributions to the field of exposure apparatus technology. With a focus on enhancing the precision of charged particle beams, Tokuno has made significant strides in his area of expertise.
Latest Patents
Atsushi Tokuno holds a patent for an exposure apparatus that includes a formation module designed to create charged particle beams with varying irradiation positions on a specimen. This innovative apparatus features a particle source that emits charged particle beams from an emission region, which has different widths in both longitudinal and lateral directions. Additionally, the apparatus includes an aperture array device with openings arranged in an illuminated region, illumination lenses positioned between the particle source and the aperture array device, and a beam cross-section deformation device that alters the cross-sectional shape of the charged particle beams into an anisotropic shape through the application of a magnetic or electric field. This patent showcases Tokuno's commitment to advancing technology in his field.
Career Highlights
Atsushi Tokuno is currently employed at Advantest Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in pushing the boundaries of exposure apparatus design and functionality.
Collaborations
Throughout his career, Tokuno has collaborated with notable colleagues, including Shinichi Hamaguchi and Hitoshi Tanaka. These partnerships have fostered a creative environment that encourages the exchange of ideas and technological advancements.
Conclusion
Atsushi Tokuno is a remarkable inventor whose work in exposure apparatus technology has made a significant impact in the field. His innovative spirit and dedication to research continue to inspire advancements in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
