The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2017
Filed:
Jan. 10, 2017
Advantest Corporation, Tokyo, JP;
Shinichi Hamaguchi, Tokyo, JP;
Hitoshi Tanaka, Tokyo, JP;
Atsushi Tokuno, Tokyo, JP;
Shinichi Kojima, Tokyo, JP;
Akio Yamada, Tokyo, JP;
Advantest Corp., Tokyo, JP;
Abstract
The invention provides an exposure apparatus () including a formation module () which forms charged particle beams with different irradiation positions on a specimen. The formation module () includes: a particle source () which emits the charged particle beams from an emission region () in which a width in a longitudinal direction is different from and a width in a lateral direction orthogonal to the longitudinal direction; an aperture array device () provided with openings () arranged in an illuminated region () in which a width in a longitudinal direction is different from a width in a lateral direction orthogonal to the longitudinal direction; illumination lenses () provided between the particle source () and the aperture array device (); and a beam cross-section deformation device () which is provided between the particle source () and the aperture array device (), and deforms a cross-sectional shape of the charged particle beams into an anisotropic shape by an action of a magnetic field or an electric field.