Saitama, Japan

Atsushi Itsuki


Average Co-Inventor Count = 2.5

ph-index = 3

Forward Citations = 29(Granted Patents)


Location History:

  • Ohmiya, JP (2001)
  • Omiya, JP (1997 - 2002)
  • Saitama, JP (2002)
  • Naka-gun, JP (2006)
  • Ibaraki, JP (2007)

Company Filing History:


Years Active: 1997-2007

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8 patents (USPTO):Explore Patents

Title: Innovations of Atsushi Itsuki

Introduction

Atsushi Itsuki is a prominent inventor based in Saitama, Japan. He has made significant contributions to the field of materials science, particularly in the development of hafnium-containing materials. With a total of eight patents to his name, Itsuki's work has garnered attention for its innovative approaches and practical applications.

Latest Patents

Among his latest patents, Atsushi Itsuki has developed a hafnium-containing material for film formation, which boasts excellent vaporization stability and a higher film formation rate. This material features a bond between hafnium and nitrogen atoms, or hafnium and oxygen atoms, with zirconium content limited to 650 ppm or less. Additionally, he has patented an organometallic compound characterized by bonds between metal atoms and nitrogen atoms, with strict limits on chlorine and water content. The general formula of this compound is represented in his patent documentation.

Career Highlights

Atsushi Itsuki is currently employed at Mitsubishi Materials Corporation, where he continues to push the boundaries of material science. His work has not only advanced the understanding of hafnium-based materials but has also contributed to the development of new technologies in thin film applications.

Collaborations

Throughout his career, Atsushi has collaborated with notable colleagues, including Katsumi Ogi and Hiroto Uchida. These partnerships have fostered a collaborative environment that enhances innovation and research outcomes.

Conclusion

Atsushi Itsuki's contributions to the field of materials science through his patents and collaborations highlight his role as a leading inventor. His innovative work continues to influence advancements in film formation technologies.

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