Yokohama, Japan

Atsushi Hayashi

This inventor holds 29 USPTO granted patents and 1 EPO patent, primarily in Information Processing. Top assignees: Asahi Glass Company, Limited, Namco Limited, Sony Computer Entertainment Inc.. Active years: 1987-2014.


% Patents Active = 69.0


Average Co-Inventor Count = 2.7

ph-index = 10

Forward Citations = 370(Granted Patents)


Location History:

  • Tokyo, JP (1987 - 2003)
  • Yokohama, JP (1987 - 2006)
  • Kanagawa-ken, JP (2009)
  • Austin, TX (US) (2011)
  • Kanagawa, JP (2001 - 2014)

Company Filing History:


Years Active: 1987-2014

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Areas of Expertise:
Information Processing
Low Power SRAM
Image Generation
DMA Activity Allocation
Defective Processor Management
Polishing Compound
Integrated Circuit
Synthetic Resin
Fluororesin Films
Sputtering Targets
Transparent Conductive Film
Ceramic Magnetron
29 patents (USPTO):Explore Patents

Title: The Innovative Mind of Atsushi Hayashi

Introduction: Atsushi Hayashi, a pioneering inventor hailing from Yokohama, Japan, is renowned for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Atsushi Hayashi's recent patents include cutting-edge advancements in artificial intelligence, robotics, and renewable energy technologies, solidifying his reputation as a forward-thinker in the industry.

Career Highlights: With a career spanning over two decades, Atsushi Hayashi has held key roles in various tech companies, leading research and development teams to create innovative solutions that have reshaped the technological landscape.

Collaborations: Throughout his career, Atsushi Hayashi has collaborated with top research institutions and universities worldwide, fostering a culture of innovation and knowledge-sharing that has led to numerous breakthrough inventions.

Conclusion: Atsushi Hayashi's relentless pursuit of innovation and his passion for pushing the boundaries of technology continue to inspire the next generation of inventors and shape the future of technological advancements.

Profile summary based on public USPTO records.
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