Atsuro Eitoku

Title: Atsuro Eitoku: Innovator in Substrate Processing Technologies

Introduction

Atsuro Eitoku is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 8 patents. His innovative approaches have advanced the technology used in various applications, particularly in the manufacturing sector.

Latest Patents

Eitoku's latest patents include a substrate processing apparatus and a substrate processing method. The first patent describes a process where a low surface tension liquid is supplied to a heated substrate to replace a processing liquid. This method allows for the formation of a liquid film on the substrate, which can be removed by enhancing the heating of the substrate. The second patent outlines a substrate processing method that involves supplying a rinse liquid to a substrate's surface, rotating the substrate, and then applying a hydrophobizing agent to replace the liquid on the surface. This process is designed to improve efficiency and effectiveness in substrate processing.

Career Highlights

Throughout his career, Atsuro Eitoku has worked with notable companies such as Dainippon Screen Manufacturing Co., Ltd. and Screen Holdings Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in substrate processing.

Collaborations

Eitoku has collaborated with talented individuals in his field, including Tetsuya Emoto and Tomomi Iwata. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Atsuro Eitoku's work in substrate processing has established him as a key figure in the industry. His patents reflect a commitment to innovation and efficiency, making significant strides in the technology landscape.