The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2020
Filed:
May. 30, 2018
Screen Holdings Co., Ltd., Kyoto, JP;
Takayoshi Tanaka, Kyoto, JP;
Tetsuya Emoto, Kyoto, JP;
Akira Oato, Kyoto, JP;
Yuta Nakano, Kyoto, JP;
Teppei Nakano, Kyoto, JP;
Takashi Akiyama, Kyoto, JP;
Yuya Tsuchihashi, Kyoto, JP;
Reo Tamura, Kyoto, JP;
Atsuro Eitoku, Kyoto, JP;
Tomomi Iwata, Kyoto, JP;
SCREEN Holdings Co., Ltd., , JP;
Abstract
A substrate processing method includes a rinse liquid supplying step of supplying a rinse liquid containing water to a major surface of a substrate, a rotating step of rotating the substrate around a rotation axis passing through a central portion of the major surface of the substrate, and a hydrophobizing agent supplying step of supplying a hydrophobizing agent containing a first dissolving agent to the major surface of the substrate to replace a liquid held on the major surface of the substrate with the hydrophobizing agent in parallel with the rotating step after the rinse liquid supplying step is performed, and the hydrophobizing agent supplying step includes a hydrophobizing agent discharging step of discharging a continuous flow of the hydrophobizing agent from a discharge port of a nozzle toward the major surface of the substrate held by a substrate holding unit with a Reynolds number at the discharge port being not more than 1500.