Asuka Sano

Title: Asuka Sano: Innovator in Substrate Production Technologies

Introduction

Asuka Sano is a notable inventor based in Saitama, Japan. He has made significant contributions to the field of substrate production, holding a total of four patents. His innovative methods focus on enhancing the quality and efficiency of substrates with patterned films.

Latest Patents

Asuka Sano's latest patents include a method for producing a substrate with a patterned film and a fluorine-containing copolymer. This production method involves a cleaning step that utilizes UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film. The process results in a first substrate with a patterned film, which is then subjected to a heating step to obtain a second substrate with a patterned film. Another patent details a similar method for producing a substrate with a patterned film, emphasizing the importance of contact angle adjustments during the cleaning and heating steps.

Career Highlights

Asuka Sano is currently employed at Central Glass Company, Limited, where he continues to develop innovative solutions in substrate technology. His work has been instrumental in advancing the production methods used in various applications.

Collaborations

Asuka collaborates with talented coworkers, including Yuzuru Kaneko and Keiko Sasaki, who contribute to the innovative environment at Central Glass Company.

Conclusion

Asuka Sano's contributions to substrate production technologies highlight his role as a leading inventor in his field. His patents reflect a commitment to innovation and excellence in the industry.