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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12038692 B1

PDFFull Text
Date of Patent:
Jul. 16, 2024

Filed:

May. 23, 2019

Method for producing substrate with patterned film and fluorine-containing copolymer

Applicant:

Central Glass Company, Limited, Ube, JP;

Inventors:

Yuzuru Kaneko, Saitama, JP;

Takashi Aoki, Saitama, JP;

Yusuke Nomura, Saitama, JP;

Keiko Sasaki, Saitama, JP;

Asuka Sano, Saitama, JP;

Assignee:

CENTRAL GLASS COMPANY, LIMITED, Yamaguchi, JP;

Attorney:

HSML P.C.

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/38 (2006.01); C08F 220/22 (2006.01); C08F 236/16 (2006.01); G03F 7/00 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); H01L 21/02 (2006.01); H01L 21/3065 (2006.01); H01L 33/00 (2010.01); H01L 33/44 (2010.01); H10K 50/115 (2023.01); H10K 71/00 (2023.01); H10K 71/13 (2023.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/38 (2013.01); C08F 220/22 (2013.01); C08F 236/16 (2013.01); G03F 7/0002 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); H01L 21/02046 (2013.01); H01L 21/3065 (2013.01); H01L 33/005 (2013.01); H01L 33/44 (2013.01); H10K 50/115 (2023.02); H10K 71/00 (2023.02); H10K 71/135 (2023.02); G03F 7/2006 (2013.01); H01L 2933/0025 (2013.01);
Abstract

The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film to obtain a first substrate with a patterned film, the substrate with a patterned film including a substrate and a patterned film on the substrate, the patterned film containing a fluorine-containing copolymer having a specific repeating unit; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film.

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