Bengaluru, India

Arvind Patil

This inventor holds 2 USPTO granted patents. Top assignee: Yield Engineering Systems, Inc.. Active years: 2026.


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Arvind Patil: Innovator in Cleaning Technology

Introduction

Arvind Patil is a notable inventor based in Bengaluru, India. He has made significant contributions to the field of cleaning technology, holding a total of 2 patents. His innovative designs focus on improving cleaning efficiency and substrate handling.

Latest Patents

Arvind Patil's latest patents include a "Unified rinse and dry cleaning apparatus and methods." This cleaning apparatus features a plurality of tubes with angled orifices. An angled liquid stream is directed through the orifices to clean the surface of a substrate as it moves in one direction. Subsequently, an angled gas stream is directed through the orifices to dry the surface as the substrate moves in the opposite direction. Another patent is for a "substrate carrier," which includes an enclosure designed to hold substrates. The enclosure has walls that surround the substrates, featuring a front panel, a back panel, and two side panels. It also includes an adjustable clamping mechanism and a locking mechanism to secure the positions of the substrates.

Career Highlights

Arvind Patil is currently employed at Yield Engineering Systems, Inc. His work focuses on developing advanced cleaning solutions that enhance operational efficiency in various applications. His innovative approach has positioned him as a key player in the industry.

Collaborations

Some of Arvind's coworkers include Umashankara M Nanjesh and Jerin P John. Their collaborative efforts contribute to the innovative environment at Yield Engineering Systems, Inc.

Conclusion

Arvind Patil's contributions to cleaning technology through his patents demonstrate his commitment to innovation and efficiency. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…