Location History:
- Tualatin, OR (US) (2017)
- Sherwood, OR (US) (2010 - 2024)
Company Filing History:
Years Active: 2010-2024
Title: The Innovative Contributions of Arul N Dhas
Introduction
Arul N Dhas, an esteemed inventor based in Tualatin, Oregon, has made significant advances in the field of plasma processing technology. With a portfolio of nine patents, his innovative solutions have propelled advancements in thin film deposition and substrate processing systems.
Latest Patents
One of Dhas's latest patents, titled "Plasma Enhanced Wafer Soak for Thin Film Deposition," presents apparatuses and methods that enhance the efficiency of substrate processing. The invention describes a process where an inert plasma is generated in a processing chamber, allowing the substrate to reach a steady state temperature in under 30 seconds, which is ideal for conducting plasma-enhanced chemical vapor deposition (PECVD).
Another notable patent from Dhas is focused on "Defect Control and Stability of DC Bias in RF Plasma-Based Substrate Processing Systems Using Molecular Reactive Purge Gas." This method streamlines the substrate processing protocol by selectively delivering various gases to the processing chamber, effectively depositing films while utilizing radio frequency (RF) plasma. This patent emphasizes the control of DC bias voltage during the processing, which is critical for maintaining high-quality film deposition.
Career Highlights
Throughout his career, Arul N Dhas has worked with prominent companies, including Lam Research Corporation and Novellus Systems Incorporated. His role in these organizations has allowed him to contribute to groundbreaking technologies, shaping the future of semiconductor processing.
Collaborations
Dhas has collaborated with several talented professionals in the industry, including Kareem Boumatar and Jon Henri. These collaborations have fostered an environment of innovation and have allowed the team to push the boundaries of what is possible in their field.
Conclusion
Arul N Dhas stands out as a distinguished inventor whose patents enhance the capabilities of plasma processing technology. With his continuous contributions and collaborative spirit, he remains a key figure in advancing innovative solutions for the semiconductor industry. His work not only demonstrates his technical expertise but also his commitment to driving progress through invention.