The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2020
Filed:
Aug. 08, 2018
Lam Research Corporation, Fremont, CA (US);
Arul Dhas, Sherwood, OR (US);
Kareem Boumatar, Vancouver, WA (US);
Christopher Ramsayer, Tualatin, OR (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for processing a substrate in a substrate processing system includes selectively delivering at least one of a precursor, a deposition carrier gas, and a post deposition purge gas to a processing chamber. The method includes depositing film on the substrate by generating radio frequency (RF) plasma in the processing chamber between an upper electrode and a lower electrode while supplying an RF voltage to one of the upper electrode and the lower electrode and while the precursor and the deposition carrier gas is delivered. The method includes selectively supplying a direct current (DC) bias voltage to the upper electrode or the lower electrode; moving the substrate relative to a pedestal supporting the substrate while generating the DC bias voltage; and delivering the post deposition purge gas while supplying at least a portion of the DC bias voltage to the upper electrode or the lower electrode.