Vancouver, WA, United States of America

Kareem Boumatar

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 25(Granted Patents)


Company Filing History:


Years Active: 2016-2020

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Kareem Boumatar

Introduction

Kareem Boumatar is a notable inventor based in Vancouver, WA (US), recognized for his significant contributions to the field of substrate processing systems. With a total of 4 patents to his name, Boumatar has made strides in enhancing the efficiency and effectiveness of radio frequency (RF) plasma technology.

Latest Patents

Boumatar's latest patents include groundbreaking methods for improving defect control and stability in RF plasma-based substrate processing systems. One of his notable inventions is a method for processing a substrate that involves selectively delivering various gases to a processing chamber. This method generates RF plasma between electrodes while applying a direct current (DC) bias voltage, which is crucial for film deposition on substrates. Another significant patent focuses on defect control in RF plasma substrate processing systems, utilizing a DC bias voltage during substrate movement to enhance processing outcomes.

Career Highlights

Kareem Boumatar is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to apply his innovative ideas and contribute to advancements in substrate processing technologies.

Collaborations

Throughout his career, Boumatar has collaborated with talented individuals such as Arul N Dhas and Christopher Ramsayer. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the field.

Conclusion

Kareem Boumatar's contributions to the field of substrate processing systems exemplify the impact of innovation in technology. His patents reflect a commitment to improving processes and enhancing the performance of RF plasma systems.

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