Arnold Grubenmann

Title: Arnold Grubenmann: Innovator in Photoresist Technology

Introduction

Arnold Grubenmann is a notable inventor based in Marly, Switzerland. He has made significant contributions to the field of photoresist technology, particularly in the development of materials used in semiconductor manufacturing. With a total of 5 patents to his name, Grubenmann's work has had a lasting impact on the industry.

Latest Patents

Grubenmann's latest patents focus on wet-chemical, developable, etch-stable photoresist compositions for UV radiation. These photoresist compositions are designed to be sufficiently transparent in a solvent-free state for radiation of a wavelength of approximately 193 nm. They contain nonaromatic chemical groups that can be converted into latent aromatic groups under specific process conditions, ensuring that the image structure comprised of the resist material remains intact. A preferred component with latent aromatic groups is bicyclo[3.2.2]nona-6,8-dien-3-one. The resist coatings produced with these compositions exhibit stability in plasma etching that is comparable to conventional resists based on phenolic resins.

Career Highlights

Throughout his career, Arnold Grubenmann has worked with prominent companies in the field. He has been associated with Ciba-Geigy Corporation and OCG Microelectronic Materials, Inc., where he contributed to advancements in microelectronic materials and photoresist technologies.

Collaborations

Grubenmann has collaborated with notable professionals in his field, including Manfred Hofmann and Norbert Muenzel. These collaborations have further enriched his work and contributed to the development of innovative solutions in photoresist technology.

Conclusion

Arnold Grubenmann's contributions to the field of photoresist technology demonstrate his innovative spirit and dedication to advancing semiconductor manufacturing processes. His patents and collaborations reflect a commitment to excellence in the industry.