Armin Kübelbeck

Title: Armin Kübelbeck: Innovator in Silicon Etching Technologies

Introduction

Armin Kübelbeck is a notable inventor based in Bensheim, Germany. He has made significant contributions to the field of silicon surface technologies, holding a total of 4 patents. His work focuses on developing innovative etching media that enhance the efficiency and effectiveness of silicon processing.

Latest Patents

Kübelbeck's latest patents include groundbreaking inventions such as etching pastes for silicon surfaces and layers. This invention relates to novel etching media designed for etching selected areas or the entire area of silicon surfaces and layers. Another significant patent is for combined etching and doping media, which are HF/fluoride-free solutions suitable for both etching inorganic layers and doping underlying layers. This invention also encompasses a process for employing these media effectively.

Career Highlights

Throughout his career, Armin Kübelbeck has worked with prominent companies, including Merck Patent GmbH and Merck Patent Gesellschaft. His experience in these organizations has allowed him to refine his expertise in patent development and innovation in silicon technologies.

Collaborations

Kübelbeck has collaborated with notable colleagues such as Sylke Klein and Werner Stockum, contributing to advancements in their respective fields.

Conclusion

Armin Kübelbeck's contributions to silicon etching technologies demonstrate his innovative spirit and commitment to advancing the industry. His patents reflect a deep understanding of the complexities involved in silicon processing, making him a valuable figure in the field.