The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2012

Filed:

Oct. 07, 2008
Applicants:

Sylke Klein, Roβdorf, DE;

Armin Kübelbeck, Bensheim, DE;

Werner Stockum, Reinheim, DE;

Wilfried Schmidt, Schwaigern, DE;

Berthold Schum, Biebergmünd, DE;

Inventors:

Sylke Klein, Roβdorf, DE;

Armin Kübelbeck, Bensheim, DE;

Werner Stockum, Reinheim, DE;

Wilfried Schmidt, Schwaigern, DE;

Berthold Schum, Biebergmünd, DE;

Assignee:

Merck Patent GmbH, Darmstadt, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 31/00 (2006.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates firstly to HF/fluoride-free etching and doping media which are suitable both for the etching of inorganic layers and also for the doping of underlying layers. The present invention secondly also relates to a process in which these media are employed.


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