Geldrop, Netherlands

Armand Rosa Jozef Dassen

This inventor holds 8 USPTO granted patents. Top assignee: Asml Netherlands B.v.. Active years: 2015-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Armand Rosa Jozef Dassen. Retrieved from https://idiyas.com/inventor/armand-rosa-jozef-dassen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 87.5

Average Co-Inventor Count = 6.0

ph-index = 4

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 2015-2026

Loading Chart...
8 patents (USPTO):Explore Patents

Title: Innovation Extraordinaire - Armand Rosa Jozef Dassen

Introduction: Armand Rosa Jozef Dassen, a brilliant inventor hailing from Geldrop, NL, has made significant contributions to the field of technology with his inventive spirit and relentless pursuit of excellence.

Latest Patents: Armand Rosa Jozef Dassen holds an impressive total of 7 patents, with his latest innovations focusing on the development of a support table for a lithographic apparatus. This support table features a unique design that enhances heat transfer to or from the substrate, optimizing the device manufacturing process.

Career Highlights: A key figure at ASML Netherlands B.V., Armand Rosa Jozef Dassen has played a pivotal role in shaping the advancements in lithographic technology. His expertise and creative approach have led to the successful implementation of cutting-edge solutions in the field.

Collaborations: Collaboration is at the core of Armand Rosa Jozef Dassen's success story, having worked closely with talented individuals such as Johan Gertrudis Cornelis Kunnen and Martijn Houben. Together, they have pushed the boundaries of innovation and set new standards in the industry.

Conclusion: In conclusion, Armand Rosa Jozef Dassen stands out as a visionary inventor whose ingenuity and dedication have left an indelible mark on the world of technology. His relentless pursuit of innovation continues to inspire and drive forward progress in the field of lithography.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…