The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2019
Filed:
Apr. 20, 2018
Asml Netherlands B.v., Veldhoven, NL;
Johan Gertrudis Cornelis Kunnen, Weert, NL;
Martijn Houben, 's-Hertogenbosch, NL;
Thibault Simon Mathieu Laurent, Eindhoven, NL;
Hendrikus Johannes Marinus Van Abeelen, Moergestel, NL;
Armand Rosa Jozef Dassen, Geldrop, NL;
Sander Catharina Reinier Derks, Budel, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.