Ness-Ziona, Israel

Ariel Hirszhorn


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019-2021

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3 patents (USPTO):

Title: Innovations by Ariel Hirszhorn in Semiconductor Technology

Introduction

Ariel Hirszhorn is a notable inventor based in Ness-Ziona, Israel. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative approach to solving complex problems in this industry.

Latest Patents

One of his latest patents is titled "Guided inspection of a semiconductor wafer based on spatial density analysis." This invention involves identifying samples on a semiconductor wafer that have been reviewed by a review tool. It also includes the identification of candidate samples that have not yet been reviewed, determining their locations, and selecting them for review based on the proximity of other reviewed samples.

Another significant patent is "Method of examining defects in a semiconductor specimen and system thereof." This patent describes a process where a first defect map representing defects in a semiconductor specimen is received. Scores are assigned to classified defects, indicating the number of defects within a threshold distance in the attribute hyperspace. A second defect map is then used to select defects for review based on these scores.

Career Highlights

Ariel Hirszhorn works at Applied Materials Israel Limited, a company known for its advanced technology solutions in the semiconductor industry. His work focuses on enhancing the efficiency and accuracy of semiconductor inspections, which is crucial for the production of high-quality electronic components.

Collaborations

Ariel collaborates with Yotam Sofer, contributing to the development of innovative solutions in semiconductor technology. Their partnership exemplifies the importance of teamwork in driving advancements in this field.

Conclusion

Ariel Hirszhorn's contributions to semiconductor technology through his patents reflect his commitment to innovation and excellence. His work continues to influence the industry, paving the way for future advancements in semiconductor manufacturing.

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