Veldhoven, Netherlands

Antonius Johannes Van De Pas


Average Co-Inventor Count = 8.5

ph-index = 2

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2008-2009

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2 patents (USPTO):Explore Patents

Sure, here is the article about inventor Antonius Johannes Van De Pas:

Title: Innovator Spotlight: Antonius Johannes Van De Pas

Introduction:

Antonius Johannes Van De Pas is a renowned inventor based in Veldhoven, Netherlands. With a remarkable career in the field of innovation, he has successfully secured two patents for his groundbreaking work.

Latest Patents:

Van De Pas's latest patents revolve around a lithographic apparatus, contaminant trap, and device manufacturing method. The lithographic apparatus includes a sophisticated radiation system with a unique contaminant trap designed to enhance the efficiency of the radiation beam. The contaminant trap features foils or plates that define channels oriented radially, with a gas injector for injecting gas at different positions, thereby optimizing the device manufacturing process.

Career Highlights:

Antonius Johannes Van De Pas is associated with the renowned company ASML Netherlands B.V., a prominent player in the technology and semiconductor industry. His contributions to the company's research and development have been instrumental in advancing lithographic technologies for precision manufacturing.

Collaborations:

Throughout his career, Van De Pas has collaborated with esteemed colleagues such as Leonid Aizikovitch Sjmaenok and Vadim Yevgenyevich Banine. Together, they have shaped innovative solutions and pushed the boundaries of technological advancements in the field of lithography.

Conclusion:

Antonius Johannes Van De Pas's dedication to innovation and his pioneering work in lithography have significantly impacted the industry. His patents and collaborations stand as a testament to his expertise and commitment to driving technological progress forward.

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