Fairport, NY, United States of America

Anthony R Phillips, Jr

This inventor holds 3 USPTO granted patents. Top assignees: Tropel Corporation, General Signal Corporation. Active years: 1993-1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Anthony R Phillips, Jr. Retrieved from https://idiyas.com/inventor/anthony-r-phillips-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 155(Granted Patents)


Company Filing History:


Years Active: 1993-1997

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Anthony R Phillips, Jr.

Introduction

Anthony R Phillips, Jr. is a notable inventor based in Fairport, NY (US). He has made significant contributions to the field of imaging systems and lithography, holding a total of 3 patents. His work has advanced the technology used in various applications, particularly in the realm of deep ultraviolet lithography.

Latest Patents

One of his latest patents is an imaging system for deep ultraviolet lithography. This invention features a catadioptric reduction system that operates in the deep ultraviolet range, projecting a reduced image of a mask onto a substrate. The system includes a reducing optic made from a material that is transmissive to deep ultraviolet light, with a concave front face covered by a partially reflective surface and a convex back face surrounded by a concave reflective surface. This design allows for the transmission and reflection of light to produce a reduced image of the mask on the substrate.

Another significant patent is a lens system for X-ray projection lithography cameras. This invention provides optimum solutions for three-mirror lenses that use X-ray radiation to image a mask on a wafer. The lenses are represented as single points within regions of two-dimensional magnification space, defined by the magnification of a convex mirror and the ratio of the magnifications of a pair of concave mirrors. These lenses are designed to achieve extremely low distortion and a resolution of about 0.1 micron or less.

Career Highlights

Throughout his career, Anthony has worked with several companies, including Tropel Corporation and General Signal Corporation. His experience in these organizations has contributed to his expertise in optical design and lithography technologies.

Collaborations

Anthony has collaborated with notable individuals in his field, including John H Bruning and David R Shafer. These collaborations have likely enriched his work and led to innovative advancements in imaging systems.

Conclusion

Anthony R Phillips, Jr. is a distinguished inventor whose contributions to imaging systems and lithography have had a lasting impact on the industry. His patents reflect his innovative spirit and dedication to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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