Tropel Corporation

General Signal Corporation

Anthony R Phillips, Jr

David R Shafer

John H Bruning

Alan D White

Paul Francis Michaloski

A catadioptric reduction system operating in the deep ultraviolet range projects a reduced image of a mask on a substrate. A reducing optic made of a material transmissive to deep ultraviolet light has a concave front face covered by a partially reflective surface and a convex back face covered by a concave reflective surface surrounding a central aperture. The partially reflective surface transmits a portion of the light passing through the mask to the concave reflecting surface, which returns a portion of the transmitted light to the partially reflective surface. A portion of the returned light is reflected by the partially reflective surface on a converging path through said central aperture for producing a reduced image of the mask on the substrate.

Imaging system for deep ultraviolet lithography

Optimum solutions for three-mirror lenses for projection lithography cameras using X-ray radiation to image a mask on a wafer are represented as single points within regions of two-dimensional magnification space defined by the magnification of a convex mirror as one coordinate and the ratio of the magnifications of a pair of concave mirrors optically on opposite sides of the convex mirror as another coordinate. Lenses within region 30, 50, and preferably within region 40, 60, of such magnification space represent potential solutions that are optimizable by standard computer optical design programs and techniques to achieve extremely low distortion lenses having a resolution of about 0.1 micron or less. Two of these lens systems having large chief ray angles at the mask and chief rays inclined away from the optical axis of the lens system in a direction from the source toward the mask are described in more detail.

Lens system for X-ray projection lithography camera

Optimum solutions for three-mirror lenses for projection lithography cameras using X-ray radiation to image a mask on a wafer are represented as single points within regions of two-dimensional magnification space defined by the magnification of a convex mirror as one coordinate and the ratio of the magnifications of a pair of concave mirrors optically on opposite sides of the convex mirror as another coordinate. Lenses within region 30, 50, and preferably within region 40, 60, of such magnification space represent potential solutions that are optimizable by standard computer optical design programs and techniques to achieve extremely low distortion lenses having a resolution of about 0.1 micron or less.

Growing community of inventors

Fairport, NY, United States of America

Anthony R Phillips, Jr