This inventor holds 1 USPTO granted patent. Top assignee: Entegris, Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Anthony D. Ozzello and Iodosilane Purification
Introduction
Anthony D. Ozzello is an inventor associated with Round Rock, Texas, and Entegris, Inc. His patent work addresses the purification of iodosilanes, compounds used in processes for depositing silicon-containing films on microelectronic device substrates.
Latest Patents
The supplied information identifies one patent associated with Ozzello: “Method for Purifying Iodosilanes.” The invention describes removing trace amounts of certain metal-ion contaminants from iodosilanes, including diiodosilane. The resulting liquid compositions are intended to support the deposition of silicon-containing films on microelectronic substrates. Ozzello is credited with 1 patent in the information provided.
Career Highlights
Ozzello’s listed work at Entegris, Inc. connects his invention to materials and processes used in microelectronics manufacturing. The patent focuses on improving the purity of iodosilane compositions for thin-film deposition applications.
Collaborations
The supplied information names SungCheol Yoon and Hyunho Jung as Ozzello’s coworkers. It does not specify whether they collaborated on the patent.
Conclusion
Anthony D. Ozzello’s listed patent concerns purifying iodosilanes for use in depositing silicon-containing films, reflecting a contribution to materials processing for microelectronic devices.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile