Anju Narendra

Title: **The Innovative Mind of Anju Narendra: Shaping the Future of Fluid Handling and Wafer Polishing**

Introduction

Anju Narendra is an accomplished inventor based in Beaverton, Oregon, known for her significant contributions to the fields of control systems and semiconductor processing. With a total of two patents to her name, she has developed groundbreaking methods that enhance operational efficiency in fluid handling systems and improve the precision of wafer polishing processes.

Latest Patents

Anju’s latest innovations include two notable patents. The first patent focuses on **Wafer Polishing Control**, which details methods of controlling the polishing of wafers. This inventive process includes measuring one or more pre-polish thicknesses of the layers of a wafer before the polishing process. The post-polish thickness is subsequently measured, and the polishing is adjusted using both feed-forward and feed-back control methodologies based on these thickness measurements. Furthermore, this invention encompasses machine-accessible software designed to execute these methods and systems where such methods can be effectively implemented.

Her second patent addresses the **Model-Based Detection of Leaks and Blockages in Fluid Handling Systems**. This invention introduces a fault detection and isolation system that identifies leaks and blockages in fluid handling systems through the use of sensors, which measure conditions both upstream and downstream of the component in question. The data generated by these sensors is utilized by a control algorithm to estimate the inlet and outlet states, enabling the detection of any anomalies through the comparison of innovation sequences against predetermined thresholds.

Career Highlights

Anju has worked with reputable organizations such as General Electric Company and Intel Corporation. Her experience in these esteemed companies has undoubtedly influenced her innovations and has allowed her to contribute her expertise to cutting-edge technologies.

Collaborations

During her career, Anju has closely collaborated with other professionals in her field, including Harry Kirk Mathews, Jr. and Ravi Rajamani. These partnerships have played a vital role in enhancing her research and the development of her patents.

Conclusion

Anju Narendra continues to pave the way for advancements in wafer polishing and fluid handling systems through her innovative ideas and dedicated work. With her patents, she is not only contributing to technology but is also inspiring future inventors to explore new frontiers in engineering and invention.