Santa Clara, CA, United States of America

Anil K Pant


Average Co-Inventor Count = 3.5

ph-index = 11

Forward Citations = 374(Granted Patents)


Location History:

  • Santa Cruz, CA (US) (1998 - 2003)
  • Santa Clara, CA (US) (2000 - 2005)

Company Filing History:


Years Active: 1998-2005

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16 patents (USPTO):Explore Patents

Title: Inventor Spotlight: Anil K. Pant

Introduction

Anil K. Pant is a distinguished inventor based in Santa Clara, CA, with an impressive portfolio of 16 patents to his name. His innovations primarily focus on advancing technology in the semiconductor industry, particularly through the development of specialized polishing pads used in semiconductor fabrication.

Latest Patents

Among his notable contributions is his patent regarding the "Fabrication of an Ion Exchange Polish Pad." This invention presents an advanced ion exchange polish pad designed for polishing semiconductor substrates that have various layers, including conductive copper. The invention encompasses a unique base material integrated with an ion exchange layer, which effectively exchanges cations like copper under specified conditions, enhancing the planarization process of semiconductor substrates.

Another significant patent credited to Anil K. Pant is the "Method and Apparatus to Recondition an Ion Exchange Polish Pad." This creation introduces a technique to condition and regenerate the binding capacity of the polish pad, allowing efficient removal of cations, including copper, from surfaces. By implementing a reconditioning head and employing a reconditioning medium, the pad can be rejuvenated by exchanging bound cations with protons, ensuring it remains effective for further use.

Career Highlights

Throughout his career, Anil has made substantial contributions while working with leading companies in the semiconductor domain, including Lam Research Corporation and Planar Labs Corporation. His work in these organizations has significantly influenced the advancement of semiconductor polishing technologies.

Collaborations

In his innovative journey, Anil has collaborated with notable individuals like Wilbur C. Krusell and Douglas W. Young. These partnerships have fostered an environment of creativity and technical advancement, propelling the development of cutting-edge technologies that benefit the semiconductor industry.

Conclusion

Anil K. Pant’s contributions to the field of semiconductor technology illustrate the critical impact of innovation in advancing manufacturing processes. With his expertise and a broad range of patents, he continues to inspire future inventions in the semiconductor sector, ensuring a lasting legacy within the engineering community.

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