Andrew N Gerhan

Title: The Innovative Contributions of Andrew N. Gerhan

Introduction

Andrew N. Gerhan is a notable inventor based in Oakland, California. He has made significant contributions to the field of plasma arc vapor deposition technology. With a total of five patents to his name, Gerhan's work has advanced the methods and apparatuses used in film deposition processes.

Latest Patents

Gerhan's latest patents include a coaxial plasma arc vapor deposition apparatus and method. This innovative apparatus is designed for the deposition of plasma reaction films, which can either be thin or thick. The substrate used in this apparatus allows for film deposition that adheres to the substrate, as well as films that can be removed after deposition. Additionally, the cathode can be constructed from individual wires or a single conductor. Another significant patent involves an apparatus for depositing a variable thickness coating onto the inside of a cylindrical tube. This design utilizes a variable pressure gas and a coaxially positioned cathode within the cylinder, generating a radial plasma arc that travels down the cylinder's central axis.

Career Highlights

Gerhan's career is marked by his innovative approaches to plasma technology. His patents reflect a deep understanding of the complexities involved in film deposition and the manipulation of plasma arcs. His work has implications for various industries, including materials science and manufacturing.

Collaborations

Gerhan has collaborated with notable colleagues such as Mahadevan Krishnan and Jason Wright. These partnerships have likely contributed to the development and refinement of his patented technologies.

Conclusion

Andrew N. Gerhan's contributions to plasma arc vapor deposition technology demonstrate his innovative spirit and technical expertise. His patents not only advance the field but also pave the way for future developments in film deposition methods.