Alameda Applied Sciences Corporation

Andrew N Gerhan

Mahadevan Krishnan

Michael Y Au

Jason Wright

Jochen Schein

Robyn L Woo

Michael D McFarland

Benjamin Tang

Kristi Wilson

Brian L Bures

Kelan Champagne

An apparatus for deposition of plasma reaction films includes a substrate for the deposition of either thin or thick films. The substrate also allows for a film deposition which adheres to the substrate, and also films which may be removed after deposition. The cathode may be fabricated from individual wires, or it may be fabricated from a single conductor. A macro-particle filter which preferentially traps larger particles may be introduced between a porous cathode and the deposition surface. The macro-particle filter may also carry electrical current as is useful for generating a magnetic field such that a Lorentz force acts preferentially on ionized particles, allowing them to pass through the filter while trapping macroparticles that are not influenced by the magnetic field.

Coaxial plasma arc vapor deposition apparatus and method

An apparatus for the deposition of a variable thickness coating onto the inside of a cylindrical tube comprises a variable pressure gas, an cathode coaxially positioned within the cylinder, and a voltage source applied between the cathode and cylindrical tube, which functions as an anode. A radial plasma arc is generated between the anode and cathode at a starting point on the cylinder, and the plasma arc travels down the central axis of the cylinder, providing a helical deposition region on the inside of the cylinder. Selection of the combination of cathode material and gas enable the plasma to generate ionic material which is deposited on the anodic cylinder in the region of the plasma. By varying the pressure of variable pressure gas for each helical path, it is possible to vary the composition of this deposition film.

A Liquid Metal Ion Thruster (LMIT) has a substrate having a plurality of pedestals, one end of the pedestal attached to the substrate, and the opposing end of the pedestal having a tip, the pedestals having grooves and the substrate also having grooves coupled to each other and to a source of liquid metal. An extractor electrode positioned parallel to the substrate and above the pedestal tips provides an electrostatic extraction field sufficient to accelerate ions from the tips of the pedestals through the extractor electrode. A series of focusing electrodes with matching apertures provides a flow of substantially parallel ion trajectories, and an optional negative ion source provides a charge neutralization to prevent space charge spreading of the exiting accelerated ions. The assembly is suitable for providing thrust for a satellite while maintaining high operating efficiencies.

Liquid metal ion thruster array

An apparatus for producing a vacuum arc plasma source device using a low mass, compact inductive energy storage circuit powered by a low voltage DC supply acts as a vacuum arc plasma thruster. An inductor is charged through a switch, subsequently the switch is opened and a voltage spike of Ldi/dt is produced initiating plasma across a resistive path separating anode and cathode. The plasma is subsequently maintained by energy stored in the inductor. Plasma is produced from cathode material, which allows for any electrically conductive material to be used. A planar structure, a tubular structure, and a coaxial structure allow for consumption of cathode material feed and thereby long lifetime of the thruster for long durations of time.

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Oakland, CA, United States of America

Andrew N Gerhan