The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2006
Filed:
Aug. 16, 2004
Jochen Schein, Alameda, CA (US);
Andrew N. Gerhan, Oakland, CA (US);
Robyn L. Woo, El Cerrito, CA (US);
Michael Y. AU, Emeryville, CA (US);
Mahadevan Krishnan, Oakland, CA (US);
Jochen Schein, Alameda, CA (US);
Andrew N. Gerhan, Oakland, CA (US);
Robyn L. Woo, El Cerrito, CA (US);
Michael Y. Au, Emeryville, CA (US);
Mahadevan Krishnan, Oakland, CA (US);
Alameda Applied Sciences Corp., San Leandro, CA (US);
Abstract
An apparatus for producing a vacuum arc plasma source device using a low mass, compact inductive energy storage circuit powered by a low voltage DC supply acts as a vacuum arc plasma thruster. An inductor is charged through a switch, subsequently the switch is opened and a voltage spike of Ldi/dt is produced initiating plasma across a resistive path separating anode and cathode. The plasma is subsequently maintained by energy stored in the inductor. Plasma is produced from cathode material, which allows for any electrically conductive material to be used. A planar structure, a tubular structure, and a coaxial structure allow for consumption of cathode material feed and thereby long lifetime of the thruster for long durations of time.