The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
Nov. 07, 2005
Brian L. Bures, Alameda, CA (US);
Jason D. Wright, San Mateo, CA (US);
Michael Y. AU, Fremont, CA (US);
Andrew N. Gerhan, Oakland, CA (US);
Mahadevan Krishnan, Oakland, CA (US);
Brian L. Bures, Alameda, CA (US);
Jason D. Wright, San Mateo, CA (US);
Michael Y. Au, Fremont, CA (US);
Andrew N. Gerhan, Oakland, CA (US);
Mahadevan Krishnan, Oakland, CA (US);
Alameda Applied Sciences Corp, San Leandro, CA (US);
Abstract
An apparatus for deposition of plasma reaction films includes a substrate for the deposition of either thin or thick films. The substrate also allows for a film deposition which adheres to the substrate, and also films which may be removed after deposition. The cathode may be fabricated from individual wires, or it may be fabricated from a single conductor. A macro-particle filter which preferentially traps larger particles may be introduced between a porous cathode and the deposition surface. The macro-particle filter may also carry electrical current as is useful for generating a magnetic field such that a Lorentz force acts preferentially on ionized particles, allowing them to pass through the filter while trapping macroparticles that are not influenced by the magnetic field.