Andreas Raba

Title: Innovations of Andreas Raba in Optical Assembly Technology

Introduction

Andreas Raba is a notable inventor based in Munich, Germany. He has made significant contributions to the field of optical assembly technology, particularly in applications related to semiconductor lithography. With a total of three patents to his name, Raba's work showcases his expertise and innovative spirit.

Latest Patents

Raba's latest patents include an optical assembly, a method for controlling an optical assembly, and a projection exposure apparatus. The optical assembly for semiconductor lithography comprises an optical element and an actuator designed to deform the optical element. This actuator consists of at least three sections, which include a first and second group of sections that can be controlled independently via a controller. The first group is responsible for coarse actuation, while the second group handles fine actuation. The controller is designed to manage the groups independently and to control the sections of a group collectively. Additionally, the controller can variably set the number of sections controlled jointly per group. Furthermore, the disclosure relates to a projection exposure apparatus equipped with this assembly, along with a method for controlling the optical assembly.

Career Highlights

Andreas Raba is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and semiconductor manufacturing. His work at this prestigious organization has allowed him to push the boundaries of optical technology and contribute to advancements in the industry.

Collaborations

Raba has collaborated with several talented individuals, including Markus Raab and Johannes Lippert. These collaborations have fostered a creative environment that has led to innovative solutions in optical assembly technology.

Conclusion

Andreas Raba's contributions to optical assembly technology and his innovative patents highlight his role as a key figure in the field. His work continues to influence advancements in semiconductor lithography and optical systems.