Andreas Kloeppel

Title: Innovations by Andreas Kloeppel

Introduction

Andreas Kloeppel is a notable inventor based in Glauburg, Germany. He has made significant contributions to the field of substrate processing systems, holding a total of 3 patents. His work focuses on advanced coating technologies that enhance the efficiency and effectiveness of thin film deposition.

Latest Patents

One of his latest patents is a coating apparatus and method designed for processing an essentially vertically oriented substrate. This system includes multiple processing chambers that work in tandem to deposit various layers of materials onto the substrate. The first processing chamber deposits a first layer, while the second and third chambers add additional layers, ensuring a streamlined and efficient coating process.

Another significant invention is a double-coating device with a single process chamber. This device is engineered for the deposition of thin films on large area substrates. It features an electrode arrangement capable of generating plasma on opposing sides, allowing for simultaneous coating of multiple substrates. This innovative approach not only improves the coating process but also enhances the quality of the thin films produced.

Career Highlights

Throughout his career, Andreas Kloeppel has worked with prominent companies in the industry, including Applied Materials, Inc. and Unaxis Deutschland GmbH. His experience in these organizations has contributed to his expertise in substrate processing and coating technologies.

Collaborations

Andreas has collaborated with notable professionals in his field, including Christoph Daube and Johannes Stollenwerk. These partnerships have further enriched his work and led to advancements in coating technologies.

Conclusion

Andreas Kloeppel's innovative contributions to substrate processing and coating technologies have established him as a key figure in the field. His patents reflect a commitment to enhancing the efficiency and quality of thin film deposition processes.