Andranik Sarkissian

Title: Andranik Sarkissian: Innovator in Thin Film Coating and Ferroelectric Junctions

Introduction

Andranik Sarkissian is a notable inventor based in Brossard, Canada. He has made significant contributions to the field of materials science, particularly in the areas of thin film coating and ferroelectric tunnel junctions. With a total of 2 patents to his name, Sarkissian's work has implications for various technological advancements.

Latest Patents

Sarkissian's latest patents include a method and system for thin film coating. This innovative system involves a substrate and a negatively biased target mounted on a magnetron sputtering cathode. A laser beam from a pulsed laser is focused on the target, triggering a magnetron plasma that ejects vaporized and ionized material onto the substrate. His second patent focuses on a method for fabricating a ferroelectric tunnel junction. This process includes growing a hafnium zirconium oxide film barrier layer by sputtering in the presence of oxygen at controlled temperatures, which is crucial for the junction's performance.

Career Highlights

Throughout his career, Sarkissian has worked with reputable organizations such as Plasmionique Inc. and the National Institute of Scientific Research. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking research in his field.

Collaborations

Sarkissian has collaborated with notable colleagues, including Rafik Nouar and Andreas Ruediger. These partnerships have fostered an environment of innovation and have led to advancements in their respective areas of expertise.

Conclusion

Andranik Sarkissian's contributions to thin film technology and ferroelectric junctions highlight his role as a significant inventor in the field. His patents and collaborations reflect a commitment to advancing materials science and technology.