The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2022

Filed:

Dec. 13, 2017
Applicant:

Plasmionique Inc., Brossard, CA;

Inventors:

Daniele Benetti, Montreal, CA;

Riad Nechache, Montreal, CA;

Henri Pepin, Pau, FR;

Jennifer MacLeod, New Farm, AU;

Federico Rosei, Montreal, CA;

Rafik Nouar, Boucherville, CA;

Andranik Sarkissian, Brossard, CA;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/08 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01); C23C 14/50 (2006.01); C30B 23/02 (2006.01); C30B 29/16 (2006.01); C30B 29/22 (2006.01); H01J 37/32 (2006.01); H01J 37/34 (2006.01); H01L 21/02 (2006.01); C30B 23/06 (2006.01);
U.S. Cl.
CPC ...
C23C 14/086 (2013.01); C23C 14/08 (2013.01); C23C 14/083 (2013.01); C23C 14/085 (2013.01); C23C 14/345 (2013.01); C23C 14/35 (2013.01); C23C 14/352 (2013.01); C23C 14/505 (2013.01); C30B 23/02 (2013.01); C30B 23/063 (2013.01); C30B 29/16 (2013.01); C30B 29/22 (2013.01); H01J 37/32724 (2013.01); H01J 37/3405 (2013.01); H01J 37/3429 (2013.01); H01L 21/02414 (2013.01); H01L 21/02565 (2013.01); H01L 21/02631 (2013.01); C23C 14/3485 (2013.01); H01L 21/0242 (2013.01);
Abstract

A method and a system for film deposition, the system comprising a substrate and a negatively biased target, the target being mounted on a magnetron sputtering cathode and located at a distance from the substrate, wherein a laser beam from a pulsed laser is focused on the target, thereby triggering a magnetron plasma or ejecting vaporized and ionized material from the target in an existing magnetron plasma, the magnetron plasma sputtering material from the target depositing on the substrate.


Find Patent Forward Citations

Benetti, Daniele. (2022). Thin film coating and method of fabrication thereof (U.S. Patent No. 11274360). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11274360

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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