Amit Jain

Title: Innovations by Inventor Amit Jain

Introduction

Amit Jain is a prominent inventor based in Mountain View, CA (US). He has made significant contributions to the field of technology, particularly in the area of etching processes. With a total of 4 patents to his name, Jain continues to push the boundaries of innovation.

Latest Patents

Amit Jain's latest patents include groundbreaking methods for etching carbon materials. One of his notable inventions is the method for etching features into carbon material using a metal-doped carbon-containing hard mask. This innovative approach reduces and eliminates the redeposition of silicon-containing residues during the etching process. The method involves depositing a metal-doped carbon-containing hard mask over the carbon material, patterning the mask, and using it to etch the carbon material without the need for a silicon-containing mask.

Another significant patent is the method for etching features into an etch layer through a patterned mask in a plasma processing chamber. This method utilizes a main etch gas that is formed into a main etch plasma, with a bias greater than 600 volts pulsed at a frequency between 1 Hz and 20 kHz, ensuring efficient etching.

Career Highlights

Amit Jain is currently employed at Lam Research Corporation, where he applies his expertise in etching technologies. His work has been instrumental in advancing the capabilities of plasma processing and etching techniques.

Collaborations

Some of his notable coworkers include S M Reza Sadjadi and Anne Le Gouil, who contribute to the innovative environment at Lam Research Corporation.

Conclusion

Amit Jain's contributions to the field of etching technology exemplify his commitment to innovation. His patents reflect a deep understanding of materials and processes that are crucial for advancements in the industry.