Amir Handelman

Title: Amir Handelman: Innovator in Optical Metrology

Introduction

Amir Handelman is a notable inventor based in Hod-Hasharon, Israel. He has made significant contributions to the field of optical metrology, holding two patents that showcase his innovative approach to analyzing and utilizing landscapes for improved measurement accuracy.

Latest Patents

One of Amir's latest patents is titled "Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology." This patent provides methods for deriving a partially continuous dependency of metrology metrics on recipe parameters. It involves analyzing this dependency to determine a metrology recipe and conducting measurements accordingly. The analysis may take the form of a sensitivity landscape, where regions of low sensitivity and points of low inaccuracy are identified. This approach optimizes measurements and enhances robustness against inaccuracies.

Another significant patent is "Composition and method for forming a dielectric layer." This patent describes a porous layer made from a solidified sol-gel inorganic material, featuring a distribution of nanometric voids. Some of these voids are partially coated with carbon or a hydrophobic substance containing carbon, which contributes to the material's unique properties.

Career Highlights

Amir Handelman has worked with prominent companies in the field, including Kla Corporation and Ramot at Tel-Aviv University Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in optical metrology