Cabuyao, Philippines

Amileth Dejan Cabrera

This inventor holds 1 USPTO granted patent. Top assignee: Nexperia B.v.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Amileth Dejan Cabrera. Retrieved from https://idiyas.com/inventor/amileth-dejan-cabrera

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Amileth Dejan Cabrera: Innovator in Semiconductor Technology

Introduction

Amileth Dejan Cabrera is a notable inventor based in Cabuyao, Philippines. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique method for dicing semiconductor wafers.

Latest Patents

Cabrera holds a patent for a semiconductor wafer dicing method. This method addresses the challenges of cutting bowed or warped semiconductor wafers. It involves cutting along the saw streets in a first direction on one half of the wafer, followed by similar cuts on the opposite half. The process ensures that all dies are separated, with flat sides in the bowing direction and stepped sides perpendicular to it. He has 1 patent to his name.

Career Highlights

Cabrera is currently employed at Nexperia B.V., a company known for its expertise in semiconductor solutions. His work at Nexperia has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in the industry.

Collaborations

Cabrera has collaborated with several talented individuals, including Crispulo Estira Lictao, Jr. and Pitak Seantumpol. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Amileth Dejan Cabrera is a prominent figure in semiconductor technology, with a focus on improving wafer dicing methods. His contributions are paving the way for advancements in the field, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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