North York, Canada

Amanda Woon-Fat

This inventor holds 1 USPTO granted patent. Top assignee: Synopsys, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Amanda Woon-Fat. Retrieved from https://idiyas.com/inventor/amanda-woon-fat-0ntqvujw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Amanda Woon-Fat and Semiconductor Design Innovation.

Introduction

Amanda Woon-Fat is an inventor associated with North York, Canada, and Synopsys, Inc. Her patent work addresses modeling mandrel tolerance in semiconductor device design.

Latest Patents

Woon-Fat is named on 1 patent: “Modeling Mandrel Tolerance in a Design of a Semiconductor Device.” The computer-implemented method receives a multiple patterning process design kit containing design parameters for transistors and their associated fins. It assigns each fin an index and groups the indexes by fin type. By identifying when fins associated with different transistors belong to different groups, the method detects a mandrel mismatch and determines a device parameter based on that mismatch.

Career Highlights

Her listed invention focuses on applying design-kit information to identify potential mandrel mismatches in semiconductor layouts. This approach connects fin classification with device-parameter determination during the design process.

Collaborations

Woon-Fat’s listed coworkers include John E. Barwin III and Jeroen Clemens Jozef Paasschens. The patent is associated with Synopsys, Inc.

Conclusion

Amanda Woon-Fat’s patent contribution centers on detecting mandrel mismatches through fin indexing and grouping, supporting more informed semiconductor device design.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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