Alphonse Ducarre

Title: Alphonse Ducarre: Innovator in Semiconductor Technology

Introduction

Alphonse Ducarre is a notable inventor based in Ste Genevieve des Bois, France. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on advancing the efficiency and functionality of semiconductor devices.

Latest Patents

Ducarre's latest patents include a "Semiconductor device for the vacuum-emission of electrons," which describes an electron-emitting device featuring an active semiconductor layer. This layer is designed to emit electrons from its surface, with impurity atoms doped at a decreasing density as the distance from the surface increases. Another significant patent is for a "Method of manufacturing semiconductor structures by epitaxial growth." This method involves the epitaxial growth of semiconductor devices from the liquid phase on substrates made of gallium arsenide or gallium aluminum arsenide. The process includes wiping off the last growth melt and cooling the structure while ensuring contact with a liquid gallium melt to dissolve remaining doping elements.

Career Highlights

Ducarre is currently associated with U.S. Philips Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in developing new methods and devices that enhance the performance of electronic components.

Collaborations

Throughout his career, Ducarre has collaborated with notable colleagues such as Pierre Guittard and Philippe Jarry. These partnerships have contributed to the advancement of semiconductor research and development.

Conclusion

Alphonse Ducarre's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced electronic devices.