The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 1977
Filed:
Jun. 25, 1975
Remy Henri Polaert, Villecresnes, FR;
Alphonse Ducarre, Ste Genevieve des Bois, FR;
Valere Dominique Duchenois, Paris, FR;
Jean Rodiere, Saint-Maur, FR;
U.S. Philips Corporation, New York, NY (US);
Abstract
A microchannel plate for secondary electron emission intensification, having channel walls which are rounded so as to increase the interception of secondary electrons formed due to the incidence of primary electrons on the ends of the said channel walls. According to the invention, the method of manufacturing such a channel plate consists of softening the channel wall material and by bombardment of the glass of the input surface by means of an energy-carrying beam of high power for a very short period of time. The glass of the walls at the input surface side then assumes a rounded shape under the influence of gravity and the surface stress of the glass.