Company Filing History:
Years Active: 2004-2011
Title: Alicia Walters: Innovator in Chemical-Mechanical Polishing Technologies
Introduction
Alicia Walters is a prominent inventor based in Naperville, IL (US). She has made significant contributions to the field of chemical-mechanical polishing, holding a total of 2 patents. Her work focuses on developing innovative solutions that enhance the efficiency and effectiveness of polishing processes.
Latest Patents
Alicia's latest patents include the following inventions:
1. **Stable, High Rate Silicon Slurry** - This invention provides a chemical-mechanical polishing composition that comprises wet-process silica, a stabilizer compound, a potassium salt, a secondary amine compound, and water. The invention further outlines a method of polishing a substrate using this polishing composition.
2. **Preequilibrium Polishing Method and System** - This invention presents a polishing system that includes a liquid carrier, an alkali metal ion, hydroxide ions, and a polishing pad and/or an abrasive. The abrasive can be either dispersed in the liquid carrier or bound to the polishing pad. The alkali metal ion is present in the polishing system at a concentration of about 0.05 M or more, while hydroxide ions are included to maintain a pH of about 9 or more. The liquid carrier can be any suitable polar solvent, such as water. The invention also provides a polishing method that begins about 6 hours or less after the polishing system is prepared.
Career Highlights
Alicia Walters is currently employed at Cabot Microelectronics Corporation, where she continues to innovate and develop advanced polishing technologies. Her work has significantly impacted the industry, leading to improved processes and products.
Collaborations
Alicia has collaborated with notable coworkers, including Gregory H. Bogush and Jeffrey P. Chamberlain, contributing to the advancement of their shared goals in the field of chemical-mechanical polishing.
Conclusion
Alicia Walters is a dedicated inventor whose work in chemical-mechanical polishing technologies has led to valuable innovations. Her contributions continue to shape the industry and inspire future advancements.